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Atomic layer deposited μ;-Ga2O3 solar-blind photodetectors

Accepted version
Peer-reviewed

Type

Article

Change log

Authors

Moloney, J 
Tesh, O 
Singh, M 
Roberts, JW 
Jarman, JC 

Abstract

Low temperature atomic layer deposition was used to deposit α-Ga2O3 films, which were subsequently annealed at various temperatures and atmospheres. The α-Ga2O3 phase is stable up to 400 oC, which is also the temperature that yields the most intense and sharpest reflection by X-ray diffraction. Upon annealing at 450 oC and above, the material gradually turns into the more thermodynamically stable ε or β phase. The suitability of the materials for solar-blind photodetector applications has been demonstrated with the best responsivity achieved being 1.2 A/W under 240 nm illumination and 10 V bias, for the sample annealed at 400 oC in argon. It is worth noting however that the device performance strongly depends on the annealing conditions, with the device annealed in forming gas behaving poorly. Given that the tested devices have similar microstructure, the discrepancies in device performance are attributed to hydrogen impurities.

Description

Keywords

gallium oxide, ultraviolet, photodetector, atomic layer deposition, anneal

Journal Title

Journal of Physics D: Applied Physics

Conference Name

Journal ISSN

0022-3727
1361-6463

Volume Title

52

Publisher

IOP Publishing

Rights

All rights reserved
Sponsorship
Engineering and Physical Sciences Research Council (EP/P00945X/1)
Engineering and Physical Sciences Research Council (EP/M010589/1)
EPSRC (1647980)
Engineering and Physical Sciences Research Council (EP/L016087/1)
Engineering and Physical Sciences Research Council (EP/P024947/1)
Engineering and Physical Sciences Research Council (EP/S019367/1)
Engineering and Physical Sciences Research Council (EP/R00661X/1)