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Electroforming-Free HfO2:CeO2 Vertically Aligned Nanocomposite Memristors with Anisotropic Dielectric Response

Accepted version
Peer-reviewed

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Type

Article

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Authors

Dou, H 
Gao, X 
Zhang, D 
Dhole, S 
Qi, Z 

Abstract

Resistive switching and anisotropic optical properties have been investigated in two-phase HfO2:CeO2 nanocomposite thin films of different HfO2:CeO2 ratios of 3:1, 1:1, and 1:3 on single-crystalline SrTiO3(001) substrates. Vertically aligned nanocomposite (VAN) thin films with CeO2 pillars embedded in a HfO2 matrix have been obtained using a one-step pulsed laser deposition technique. By adjusting the molar ratio of HfO2 and CeO2 in the films, the resistive switching effect and the anisotropic dielectric response were tuned and correlated with the density of the conducting vertical-phase boundaries. It is shown that only HfO2:CeO2 VAN films of 1:1 composition give rise to a forming-free switching system as they have clear vertical boundaries that guide oxygen vacancy channels. These films show strong promise for resistive switching memory devices.

Description

Keywords

HfO2, CeO2, vertically aligned nanocomposite (VAN), electroforming free, resistive switching, oxygen vacancies, anisotropy

Journal Title

ACS Applied Electronic Materials

Conference Name

Journal ISSN

2637-6113
2637-6113

Volume Title

3

Publisher

American Chemical Society (ACS)
Sponsorship
Engineering and Physical Sciences Research Council (EP/N004272/1)
Engineering and Physical Sciences Research Council (EP/P007767/1)
EPSRC (EP/T012218/1)
Royal Academy of Engineering (RAEng) (CiET1819\24)
European Commission Horizon 2020 (H2020) ERC (882929)