Nanoimprint Lithography of Al Nanovoids for Deep-UV SERS
Sigle, Daniel O
Herrmann, Lars O
ACS Applied Materials & Interfaces
American Chemical Society
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Ding, T., Sigle, D. O., Herrmann, L. O., Wolverson, D., & Baumberg, J. (2014). Nanoimprint Lithography of Al Nanovoids for Deep-UV SERS. ACS Applied Materials & Interfaces, 6 17358-17363. https://doi.org/10.1021/am505511v
Deep-ultraviolet Surface enhanced Raman scattering (UV-SERS) is a promising technique for bio-imaging and detection because many biological molecules possess UV absorption lines leading to strongly resonant Raman scattering. Here, Al nanovoid substrates are developed by combining nanoimprint lithography of etched polymer/silica opal films with electron beam evaporation, to give a high performance sensing platform for UV-SERS. Enhancement by more than three orders of magnitude in the UV-SERS performance was obtained from the DNA base adenine, matching well the UV plasmonic optical signatures and simulations, demonstrating its suitability for biodetection.
resonant Raman, nanobowls, stamps, polymer opals, adenine
We acknowledge financial support from EPSRC grant EP/G060649/1, EP/I012060/1, EP/J007552/1, ERC grant LINASS 320503.
European Research Council (320503)
External DOI: https://doi.org/10.1021/am505511v
This record's URL: https://www.repository.cam.ac.uk/handle/1810/246225
Attribution 2.0 UK: England & Wales
Licence URL: http://creativecommons.org/licenses/by/2.0/uk/