A novel paradigm for the fabrication of highly uniform nanowire arrays using residual stress-induced patterning
Accepted version
Peer-reviewed
Repository URI
Repository DOI
Change log
Authors
Zhao, Z
Wang, Nan https://orcid.org/0000-0002-7370-5998
Nan, H
Shen, L
Durkan, Colm https://orcid.org/0000-0001-9398-2813
Abstract
A residue-free, one-step method for the fabrication of 1-D materials with highly tunable geometric parameters.
Description
Keywords
nanopatterning, residue-free, 1-D materials, ZnO nanowires, piezoelectricity
Journal Title
Journal of Materials Chemistry C
Conference Name
Journal ISSN
2050-7534
2050-7526
2050-7526
Volume Title
4
Publisher
Royal Society of Chemistry (RSC)