Growth of continuous graphene by open roll-to-roll chemical vapor deposition
Teo, Kenneth BK
Rupesinghe, Nalin L
APPLIED PHYSICS LETTERS
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Zhong, G., Wu, X., D'Arsie, L., Teo, K. B., Rupesinghe, N. L., Jouvray, A., & Robertson, J. (2016). Growth of continuous graphene by open roll-to-roll chemical vapor deposition. APPLIED PHYSICS LETTERS, 109 (ARTN 193103)https://doi.org/10.1063/1.4967010
We demonstrate the growth of high-quality, continuous monolayer graphene on Cu foils using an open roll-to-roll (R2R) chemical vapor deposition (CVD) reactor with both static and moving foil growth conditions. N₂ not Ar was used as carrier gas to reduce process cost, and the concentrations of H₂ and CH₄ reactants were kept below the lower explosive limit to ensure process safety for reactor ends open to ambient. The carrier mobility of graphene deposited at a Cu foil winding speed of 5 mm/min was 5270-6040 cm² V‾¹s‾¹ at room temperature (on 50 µm × 50 µm Hall devices). These results will enable the in-line integration of graphene CVD for industrial R2R production.
The authors acknowledge funding from the EC project GRAFOL, grant 285275 and EPSRC grant Graphted EP/K0166636.
European Commission (285275)
European Commission Horizon 2020 (H2020) Future and Emerging Technologies (FET) (696656)
External DOI: https://doi.org/10.1063/1.4967010
This record's URL: https://www.repository.cam.ac.uk/handle/1810/261605