Carbon thin films with enhanced properties from cathodic arc plasmas.
University of Cambridge
Department of Engineering
Doctor of Philosophy (PhD)
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Chhowalla, M. (1998). Carbon thin films with enhanced properties from cathodic arc plasmas. (Doctoral thesis). https://doi.org/10.17863/CAM.11602
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In this thesis, the physical, optical and electronic properties of amorphous carbon ( a-C) thin films deposited using a filtered and unfiltered cathodic arcs are investigated. Firstly, the plasma properties of the filtered cathodic vacuum arc (FCVA) have been examined using planar and wire Langmuir probes in order to optimize the plasma throughput around the 90� bend. The knowledge of plasma characteristics is then utilized to understand the properties of highly tetrahedral amorphous carbon ( ta-C) films as a function of the ion energy, deposition temperature and the deposition rate. A model based on the intrinsic thermal effects of the deposition process is developed to explain the discrepancy of the sp3 fraction versus the ion energy in the literature. The possibility of p-type electronic doping of ta-C has also been investigated by the incorporation of B into the ta-C matrix. It was shown for the first time that the incorporation of B in ta-C reduces the compressive stress while maintaining high sp3 bonding. The details of a new form of arc discharge referred to as the 'stationary arc' which allows the deposition of smooth ta-C films without a bulky macroparticle filter are reported. Finally, extraordinary hardness and elastic properties of a new form of carbon arising from interlinking of graphitic nanoparticles are also presented.
This record's DOI: https://doi.org/10.17863/CAM.11602