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High Performance GaN High Electron Mobility Transistors on Low Resistivity Silicon for X -Band Applications

Accepted version
Peer-reviewed

Type

Article

Change log

Authors

Eblabla, A 
Li, X 
Thayne, I 
Wallis, DJ 
Guiney, I 

Abstract

This letter reports the RF performance of a 0.3-μm gate length AlGaN/AlN/GaN HEMT realized on a 150-mm diameter low-resistivity (LR) (σ <; 10 Ω · cm) silicon substrate. Short circuit current gain (fT) and maximum frequency of oscillation (fMAX) of 55 and 121 GHz, respectively, were obtained. To our knowledge, these are the highest fT/fMAX values reported to date for GaN HEMTs on LR silicon substrates.

Description

Keywords

AlGaN/GaN HEMTs, low-resistivity Si (111) substrate, amplifier, X-band

Journal Title

IEEE Electron Device Letters

Conference Name

Journal ISSN

0741-3106
1558-0563

Volume Title

36

Publisher

IEEE
Sponsorship
This work was supported by the Pump-Priming Scheme–EPSRC National Centre for III–V Technologies.