Passivating the sulfur vacancy in monolayer MoS2
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Authors
Lu, Haichang
Kummel, Andrew
Robertson, John
Publication Date
2018Journal Title
APL MATERIALS
ISSN
2166-532X
Publisher
AIP Publishing
Volume
6
Issue
6
Number
ARTN 066104
Type
Article
Metadata
Show full item recordCitation
Lu, H., Kummel, A., & Robertson, J. (2018). Passivating the sulfur vacancy in monolayer MoS2. APL MATERIALS, 6 (6. ARTN 066104) https://doi.org/10.1063/1.5030737
Abstract
Various methods to passivate the sulfur vacancy in 2D MoS2 are modeled using density
functional theory (DFT) to understand the passivation mechanism at an atomic
scale. First, the organic super acid, bis(trifluoromethane)sulfonimide (TFSI) is a strong
protonating agent, and it is experimentally found to greatly increase the photoluminescence
efficiency. DFT simulations find that the effectiveness of passivation depends
critically on the charge state and number of hydrogens donated by TFSI since this
determines the symmetry of the defect complex. A symmetrical complex is formed
by three hydrogen atoms bonding to the defect in a 1 charge state, and this gives
no bandgap states and a Fermi level in the midgap. However, a charge state of +1
gives a lower symmetry complex with one state in the gap. One or two hydrogens
also give complexes with gap states. Second, passivation by O2 can provide partial
passivation by forming a bridge bond across the S vacancy, but it leaves a defect
state in the lower bandgap. On the other hand, substitutional additions do not shift
the vacancy states out of the gap.
Sponsorship
Engineering and Physical Sciences Research Council (EP/P005152/1)
Identifiers
External DOI: https://doi.org/10.1063/1.5030737
This record's URL: https://www.repository.cam.ac.uk/handle/1810/283477
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