Reactive intercalation and oxidation at the buried graphene-germanium interface
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Braeuninger-Weimer, P., Burton, O., Weatherup, R., Wang, R., Dudin, P., Brennan, B., Pollard, A., et al. (2019). Reactive intercalation and oxidation at the buried graphene-germanium interface. APL Materials, 7 (7)https://doi.org/10.1063/1.5098351
We explore a number of different electrochemical, wet chemical and gas phase approaches to study intercalation and oxidation at the buried graphene-Ge interface. While previous literature focussed on the passivation of the Ge surface by chemical vapour deposited graphene, we show that particularly via electrochemical intercalation in a 0.25 N solution of anhydrous sodium acetate in glacial acetic acid this passivation can be overcome to grow GeO2 under graphene. Angle resolved photoemission spectroscopy, Raman spectroscopy, He ion microscopy and time-of-flight secondary ion mass spectrometry show that the mono-layer graphene remains undamaged and its intrinsic strain is released by the interface oxidation. Graphene acts as a protection layer for the as-grown Ge oxide, and we discuss how these insights can be utilised for new processing approaches.
We acknowledge financial support from the EPSRC (EP/K016636/1, EP/P51021X/1) and the Future Photonics Hub - Innovation Partnership Fund (EPSRC EP/L00044X/1). P.B.W. acknowledges EPSRC Cambridge NanoDTC EP/G037221/1. R.S.W. acknowledges funding from the European Union’s Horizon 2020 research and innovation programme through a EU Marie Skłodowska-Curie Individual Fellowship (Global) under grant ARTIST (no. 656870). R.W. acknowledges EPSRC Doctoral Training Award (EP/M506485/1).
EPSRC (via University of Southampton) (EP/N00762X/1)
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External DOI: https://doi.org/10.1063/1.5098351
This record's URL: https://www.repository.cam.ac.uk/handle/1810/293930
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