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Strain in heterogeneous quantum devices with atomic layer deposition

cam.issuedOnline2021-11-04
dc.contributor.authorKennedy, OW
dc.contributor.authorO'Sullivan, J
dc.contributor.authorZollitsch, CW
dc.contributor.authorThomas, CN
dc.contributor.authorWithington, S
dc.contributor.authorMorton, JJ
dc.contributor.orcidKennedy, OW [0000-0002-1945-960X]
dc.date.accessioned2021-11-04T14:50:47Z
dc.date.available2021-11-04T14:50:47Z
dc.date.issued2021-12-01
dc.date.submitted2021-08-03
dc.date.updated2021-11-04T14:50:46Z
dc.description.abstract<jats:title>Abstract</jats:title> <jats:p>We investigated the use of dielectric layers produced by atomic layer deposition (ALD) as an approach to strain mitigation in composite silicon/superconductor devices operating at cryogenic temperatures. We show that the addition of an ALD layer acts to reduce the strain of spins closest to silicon/superconductor interface where strain is highest. We show that appropriately biasing our devices at the hyperfine clock transition of bismuth donors in silicon, we can remove strain broadening and that the addition of ALD layers left <jats:italic>T</jats:italic> <jats:sub>2</jats:sub> (or temporal inhomogeneities) unchanged in these natural silicon devices.</jats:p>
dc.identifier.doi10.17863/CAM.77729
dc.identifier.eissn2633-4356
dc.identifier.issn2633-4356
dc.identifier.othermqtac2ef7
dc.identifier.otherac2ef7
dc.identifier.othermqt-100048.r2
dc.identifier.urihttps://www.repository.cam.ac.uk/handle/1810/330285
dc.languageen
dc.language.isoeng
dc.publisherIOP Publishing
dc.publisher.urlhttp://dx.doi.org/10.1088/2633-4356/ac2ef7
dc.subject51 Physical Sciences
dc.subject5104 Condensed Matter Physics
dc.titleStrain in heterogeneous quantum devices with atomic layer deposition
dc.typeArticle
dcterms.dateAccepted2021-10-12
prism.issueIdentifier4
prism.publicationNameMaterials for Quantum Technology
prism.volume1
pubs.funder-project-idEngineering and Physical Sciences Research Council (EP/P510270/1)
pubs.funder-project-idHorizon 2020 Framework Programme (771493 (LOQO-MOTIONS))
rioxxterms.licenseref.urihttps://creativecommons.org/licenses/by/4.0/
rioxxterms.versionVoR
rioxxterms.versionofrecord10.1088/2633-4356/AC2EF7

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