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dc.contributor.authorTan, Edward Kah Weien
dc.contributor.authorRughoobur, Girishen
dc.contributor.authorRubio-Lara, Juanen
dc.contributor.authorTiwale, Nikhilen
dc.contributor.authorXiao, Zhuocongen
dc.contributor.authorDavidson, Colin ABen
dc.contributor.authorLowe, Christopher Ren
dc.contributor.authorOcchipinti, Luigien
dc.date.accessioned2018-08-07T15:35:35Z
dc.date.available2018-08-07T15:35:35Z
dc.date.issued2018-04-26en
dc.identifier.issn2045-2322
dc.identifier.urihttps://www.repository.cam.ac.uk/handle/1810/278686
dc.description.abstractExisting techniques for patterning metallic structures on elastomers are limited in terms of resolution, yield and scalability. The primary constraint is the incompatibility of their physical properties with conventional cleanroom techniques. We demonstrate a reliable fabrication strategy to transfer high resolution metallic structures of <500 nm in dimension on elastomers. The proposed method consists of producing a metallic pattern using conventional lithographic techniques on silicon coated with a thin sacrificial aluminium layer. Subsequent wet etching of the sacrificial layer releases the elastomer with the embedded metallic pattern. Using this method, a nano-resistor with minimum feature size of 400 nm is fabricated on polydimethylsiloxane (PDMS) and applied in gas sensing. Adsorption of solvents in the PDMS causes swelling and increases the device resistance, which therefore enables the detection of volatile organic compounds (VOCs). Sensitivity to chloroform and toluene vapor with a rapid response (~30 s) and recovery (~200 s) is demonstrated using this PDMS nano-resistor at room temperature.
dc.format.mediumElectronicen
dc.languageengen
dc.publisherNature Publishing Group
dc.rightsAttribution 4.0 International*
dc.rights.urihttp://creativecommons.org/licenses/by/4.0/*
dc.titleNanofabrication of Conductive Metallic Structures on Elastomeric Materials.en
dc.typeArticle
prism.issueIdentifier1en
prism.publicationDate2018en
prism.publicationNameScientific reportsen
prism.startingPage6607
prism.volume8en
dc.identifier.doi10.17863/CAM.26040
dcterms.dateAccepted2018-04-09en
rioxxterms.versionofrecord10.1038/s41598-018-24901-2en
rioxxterms.versionVoR*
rioxxterms.licenseref.urihttp://www.rioxx.net/licenses/all-rights-reserveden
rioxxterms.licenseref.startdate2018-04-26en
dc.contributor.orcidRughoobur, Girish [0000-0002-1693-4532]
dc.contributor.orcidTiwale, Nikhil [0000-0001-8229-7108]
dc.contributor.orcidXiao, Zhuocong [0000-0003-2167-1623]
dc.contributor.orcidOcchipinti, Luigi [0000-0002-9067-2534]
dc.identifier.eissn2045-2322
rioxxterms.typeJournal Article/Reviewen
pubs.funder-project-idEPSRC (EP/K03099X/1)
pubs.funder-project-idTechnology Strategy Board (103543)
pubs.funder-project-idEPSRC (EP/L015978/1)


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Attribution 4.0 International
Except where otherwise noted, this item's licence is described as Attribution 4.0 International