Protons: Critical Species for Resistive Switching in Interface-Type Memristors


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Authors
Kunwar, S 
Somodi, CB 
Lalk, RA 
Rutherford, BX 
Corey, Z 
Abstract

jats:titleAbstract</jats:title>jats:pInterface‐type (IT) resistive switching (RS) memories are promising for next generation memory and computing technologies owing to the filament‐free switching, high on/off ratio, low power consumption, and low spatial variability. Although the switching mechanisms of memristors have been widely studied in filament‐type devices, they are largely unknown in IT memristors. In this work, using the simple Au/Nb:SrTiOjats:sub3</jats:sub> (Nb:STO) as a model Schottky system, it is identified that protons from moisture are key element in determining the RS characteristics in IT memristors. The Au/Nb:STO devices show typical Schottky interface controlled current–voltage (jats:italicI</jats:italic>–jats:italicV</jats:italic>) curves with a large on/off ratio under ambient conditions. Surprisingly, in a controlled environment without protons/moisture, the large jats:italicI</jats:italic>–jats:italicV</jats:italic> hysteresis collapses with the disappearance of a high resistance state (HRS) and the Schottky barrier. Once the devices are re‐exposed to a humid environment, the typical large jats:italicI</jats:italic>–jats:italicV</jats:italic> hysteresis can be recovered within hours as the HRS and Schottky interface are restored. The RS mechanism in Au/Nb:STO is attributed to the Schottky barrier modulation by a proton assisted electron trapping and detrapping process. This work highlights the important role of protons/moisture in the RS properties of IT memristors and provides fundamental insight for switching mechanisms in metal oxides‐based memory devices.</jats:p>

Description

Funder: Directorate for Social, Behavioral and Economic Sciences; Id: http://dx.doi.org/10.13039/100000088


Funder: Office of Science; Id: http://dx.doi.org/10.13039/100006132

Keywords
Au/Nb:STO, charge trapping/detrapping, interface-type memristors, moisture effect, resistive switching
Journal Title
Advanced Electronic Materials
Conference Name
Journal ISSN
2199-160X
2199-160X
Volume Title
Publisher
Wiley
Sponsorship
EPSRC (EP/T012218/1)
European Commission Horizon 2020 (H2020) ERC (882929)