Nucleation control for large, single crystalline domains of monolayer hexagonal boron nitride via Si-doped Fe catalysts.
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Authors
Abstract
The scalable chemical vapor deposition of monolayer hexagonal boron nitride (h-BN) single crystals, with lateral dimensions of ∼0.3 mm, and of continuous h-BN monolayer films with large domain sizes (>25 μm) is demonstrated via an admixture of Si to Fe catalyst films. A simple thin-film Fe/SiO2/Si catalyst system is used to show that controlled Si diffusion into the Fe catalyst allows exclusive nucleation of monolayer h-BN with very low nucleation densities upon exposure to undiluted borazine. Our systematic in situ and ex situ characterization of this catalyst system establishes a basis for further rational catalyst design for compound 2D materials.
Description
Keywords
Fe catalyst, Hexagonal boron nitride (h-BN), borazine (HBNH)3, chemical vapor deposition (CVD), in situ X-ray diffraction (XRD), secondary ion mass spectrometry (SIMS)
Journal Title
Nano Lett
Conference Name
Journal ISSN
1530-6984
1530-6992
1530-6992
Volume Title
15
Publisher
American Chemical Society (ACS)
Publisher DOI
Sponsorship
European Research Council (279342)
S.C. acknowledges funding from EPSRC (Doctoral training
award). R.S.W. acknowledges a Research Fellowship from St.
John
’
s College. B.C.B acknowledges a Research Fellowship at
Hughes Hall. A.C.-V. acknowledges the Conacyt Cambridge
Scholarship and Roberto Rocca Fellowship. S.H. acknowledges
funding from ERC grant InsituNANO (No. 279342). B.B.,
S.J.S., K.M., and A.J.P. would like to acknowledge the National
Measurement O
ffi
ce (NMO) for funding through the
Innovation, Research and Development (IRD) programme
(Project No. 115948). We acknowledge the European
Synchrotron Radiation Fac
ility (ESRF) for provision of
synchrotron radiation, and we thank the sta
ff
for assistance in
using beamline BM20/ROBL. We would also like to acknowl-
edge Prof. Bonnie J. Tyler for discussions related to the
manuscript.