Bulk molybdenum field emitters by inductively coupled plasma etching.
Phys Chem Chem Phys
Royal Society of Chemistry
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Zhu, N., Cole, M., Milne, W., & Chen, J. (2016). Bulk molybdenum field emitters by inductively coupled plasma etching.. Phys Chem Chem Phys, 18 (48), 33152-33157. https://doi.org/10.1039/c6cp06340c
In this work we report on the fabrication of inductively coupled plasma (ICP) etched, diode-type, bulk molybdenum field emitter arrays. Emitter etching conditions as a function of etch mask geometry and process conditions were systematically investigated. For optimized uniformity, aspect ratios of >10 were achieved, with 25.5 nm-radius tips realised for masks consisting of aperture arrays some 4.45 μm in diameter and whose field electron emission performance has been herein assessed.
External DOI: https://doi.org/10.1039/c6cp06340c
This record's URL: https://www.repository.cam.ac.uk/handle/1810/261598