Repository logo
 

New approaches for achieving more perfect transition metal oxide thin films

Published version
Peer-reviewed

Type

Article

Change log

Authors

MacManus-Driscoll, JL 
Yun, C 
Lee, JW 
Eom, CB 

Abstract

jats:pThis perspective considers the enormous promise of epitaxial functional transition metal oxide thin films for future applications in low power electronic and energy applications since they offer wide-ranging and highly tunable functionalities and multifunctionalities, unrivaled among other classes of materials. It also considers the great challenges that must be overcome for transition metal oxide thin films to meet what is needed in the application domain. These challenges arise from the presence of intrinsic defects and strain effects, which lead to extrinsic defects. Current conventional thin film deposition routes often cannot deliver the required perfection and performance. Since there is a strong link between the physical properties, defects and strain, routes to achieving more perfect materials need to be studied. Several emerging methods and modifications of current methods are presented and discussed. The reasons these methods better address the perfection challenge are considered and evaluated.</jats:p>

Description

Keywords

40 Engineering, 4016 Materials Engineering

Journal Title

APL Materials

Conference Name

Journal ISSN

2166-532X
2166-532X

Volume Title

8

Publisher

AIP Publishing
Sponsorship
Engineering and Physical Sciences Research Council (EP/L011700/1)
Engineering and Physical Sciences Research Council (EP/N004272/1)
European Research Council (779444)
Engineering and Physical Sciences Research Council (EP/P007767/1)
Royal Academy of Engineering (RAEng) (CiET1819\24)
EPSRC (EP/T012218/1)