Negatively Charged In-Plane and Out-Of-Plane Domain Walls with Oxygen-Vacancy Agglomerations in a Ca-Doped Bismuth-Ferrite Thin Film.
View / Open Files
Authors
Haselmann, Ulrich
Wu, Ping-Chun
van Aken, Peter A
Publication Date
2021-10-26Journal Title
ACS Appl Electron Mater
ISSN
2637-6113
Publisher
American Chemical Society (ACS)
Volume
3
Issue
10
Pages
4498-4508
Language
eng
Type
Article
This Version
VoR
Metadata
Show full item recordCitation
Haselmann, U., Suyolcu, Y. E., Wu, P., Ivanov, Y. P., Knez, D., van Aken, P. A., Chu, Y., & et al. (2021). Negatively Charged In-Plane and Out-Of-Plane Domain Walls with Oxygen-Vacancy Agglomerations in a Ca-Doped Bismuth-Ferrite Thin Film.. ACS Appl Electron Mater, 3 (10), 4498-4508. https://doi.org/10.1021/acsaelm.1c00638
Abstract
The interaction of oxygen vacancies and ferroelectric domain walls is of great scientific interest because it leads to different domain-structure behaviors. Here, we use high-resolution scanning transmission electron microscopy to study the ferroelectric domain structure and oxygen-vacancy ordering in a compressively strained Bi0.9Ca0.1FeO3-δ thin film. It was found that atomic plates, in which agglomerated oxygen vacancies are ordered, appear without any periodicity between the plates in out-of-plane and in-plane orientation. The oxygen non-stoichiometry with δ ≈ 1 in FeO2-δ planes is identical in both orientations and shows no preference. Within the plates, the oxygen vacancies form 1D channels in a pseudocubic [010] direction with a high number of vacancies that alternate with oxygen columns with few vacancies. These plates of oxygen vacancies always coincide with charged domain walls in a tail-to-tail configuration. Defects such as ordered oxygen vacancies are thereby known to lead to a pinning effect of the ferroelectric domain walls (causing application-critical aspects, such as fatigue mechanisms and countering of retention failure) and to have a critical influence on the domain-wall conductivity. Thus, intentional oxygen vacancy defect engineering could be useful for the design of multiferroic devices with advanced functionality.
Keywords
BiFeO3, oxygen vacancy, ordering in oxygen vacancy plates, charged domain wall, aberration-corrected STEM, domain-wall pinning, domain-wall nanoelectronics
Sponsorship
European Commission Horizon 2020 (H2020) Research Infrastructures (RI) (823717)
Identifiers
PMC8552442, 34723187
External DOI: https://doi.org/10.1021/acsaelm.1c00638
This record's URL: https://www.repository.cam.ac.uk/handle/1810/332191
Statistics
Total file downloads (since January 2020). For more information on metrics see the
IRUS guide.
Recommended or similar items
The current recommendation prototype on the Apollo Repository will be turned off on 03 February 2023. Although the pilot has been fruitful for both parties, the service provider IKVA is focusing on horizon scanning products and so the recommender service can no longer be supported. We recognise the importance of recommender services in supporting research discovery and are evaluating offerings from other service providers. If you would like to offer feedback on this decision please contact us on: support@repository.cam.ac.uk