Atomic scale surface modification of TiO23D nano-arrays: Plasma enhanced atomic layer deposition of NiO for photocatalysis
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Peer-reviewed
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Abstract
Here we report the development of a new scalable and transferable plasma assisted atomic layer deposition (PEALD) process for the production of uniform, conformal and pinhole free NiO with sub-nanometre control on a commercial ALD reactor.
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Journal Title
Materials Advances
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Journal ISSN
2633-5409
2633-5409
2633-5409
Volume Title
2
Publisher
Royal Society of Chemistry (RSC)
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Except where otherwised noted, this item's license is described as Attribution 4.0 International (CC BY 4.0)
Sponsorship
Engineering and Physical Sciences Research Council (EP/P007767/1)
Engineering and Physical Sciences Research Council (EP/P027032/1)
Engineering and Physical Sciences Research Council (EP/P027032/1)